AI assistant
Scientech — Investor Presentation 2018
May 22, 2018
52347_rns_2018-05-22_e05c2c37-0775-4e90-a78a-5e839fc31177.pdf
Investor Presentation
Open in viewerOpens in your device viewer
==> picture [86 x 48] intentionally omitted <==
==> picture [232 x 122] intentionally omitted <==
(3583)
2018/5/23
1
Safe Harbor Statement
==> picture [86 x 48] intentionally omitted <==
-
This Presentation contains certain forward-looking statements that are based on current expectations and are subject to known and unknown risks and uncertainties that could cause actual results to differ materially from those expressed or implied by such statements.
-
Except as required by law, we undertake no obligation to update any forward –looking statements, whether as a result of new information, future events or otherwise.
2
Scientech Corp (3583: TT)
==> picture [86 x 48] intentionally omitted <==
==> picture [525 x 318] intentionally omitted <==
----- Start of picture text -----
|||
|---|---|
|Company|
|Establishment|1979/10/17|
|IPO|2013/3/12|
|Capital|NT$ 811 Million|
|Chairman|H.L. Hsieh|
|President|M.T. Hus|
|、|、|
|Equipment Manufacturing|Wafer Reclaim|
|Products|
|Trading(Agent/Distributor)|
----- End of picture text -----
3
==> picture [86 x 48] intentionally omitted <==
Business Overvies Products
Future Prospect
4
Business Overview
Income Statement
==> picture [86 x 48] intentionally omitted <==
Units:NT $ M |
2013 | 2014 | 2015 | 2016 | 2017 | 1Q18 |
|---|---|---|---|---|---|---|
| Revenues | 3,068 | 2,717 | 2,942 | 3,495 | 3,539 | 694 |
| Gross Profit | 983 | 970 | 903 | 1,178 | 1,251 | 239 |
| Operating Expenses | 629 | 673 | 779 | 835 | 829 | 199 |
| Operating Income | 354 | 297 | 124 | 343 | 423 | 40 |
| Other Income and Expenses |
(26) | 20 | (6) | 21 | (8) | (22) |
| Income Before Tax | 328 | 317 | 119 | 363 | 415 | 18 |
| Net Income | 249 | 246 | 86 | 292 | 328 | 16 |
| EPS | 3.11 | 3.04 | 1.06 | 3.60 | 4.05 | 0.19 |
| Gross Margin | 32.04% | 35.71% | 30.69% | 33.71% | 35.36% | 34.39% |
| Operating Margin | 11.53% | 10.93% | 4.23% | 9.80% | 11.95% | 5.71% |
| Income Before Tax margin |
10.69% | 11.68% | 4.03% | 10.40% | 11.72% | 2.57% |
5
Business Overview
Products Mix
==> picture [86 x 48] intentionally omitted <==
Units:% |
2013 | 2014 | 2015 | 2016 | 2017 | Gross Margin |
|---|---|---|---|---|---|---|
| Trading | 59 | 50 | 59 | 51 | 54 | Below Average |
| Manufacturing | 41 | 50 | 41 | 49 | 46 | Above Average |
==> picture [585 x 218] intentionally omitted <==
6
Business Overview
R&D Expenses
==> picture [86 x 48] intentionally omitted <==
Units:NT $ M |
2013 | 2014 | 2015 | 2016 | 2017 |
|---|---|---|---|---|---|
| R&D Expenses | 131 | 160 | 196 | 226 | 228 |
| Expenses as % of Revenue |
4.27% | 5.89% | 6.66% | 6.48% | 6.44% |
==> picture [531 x 217] intentionally omitted <==
7
Products
==> picture [86 x 48] intentionally omitted <==
==> picture [664 x 400] intentionally omitted <==
----- Start of picture text -----
Wet Process
Equipment
Equipment
Manufacturing
Trading
Wafer
(Agent/Distr
Reclaim
ibutor)
Semiconductor and 12” Wafer
Optoelectronics
Reclaim
Process Equipment
----- End of picture text -----
8
Products
Equipment Manufacturing
==> picture [86 x 48] intentionally omitted <==
Wet process equipment Single wafer/ Batch type
- 8”/12’ Advanced packaging
==> picture [350 x 228] intentionally omitted <==
----- Start of picture text -----
、
----- End of picture text -----
、 、 (Fan-out Solder Bump 、 、 Copper Pillow Bumping 、 、 Gold Bump RDL TSV …ect)
-
6”/ 8”/12” Front-end special 、
、 -
process (IoT Sensor Power IC
、、 、 -
FP sensor RF CMOS Touch 、
-
Controller MEMS)
-
HB LED fully-automatic process
-
MEMS
-
III-V
9
Products Si Wafer Reclaim
==> picture [86 x 48] intentionally omitted <==
==> picture [683 x 430] intentionally omitted <==
----- Start of picture text -----
Advanced clean technology
Complete particle inspection
20nm/ 16nm Particle
• (SP1-DLS & SP2)
Low trace metal (<5E9)
•
12” Wafer Reclaim
Cleaning Etching
Capacity: 120K / month
Separated Cu & Non Cu
Line
Full Process
Optimization
Polishing Grinding
Complete polishing process Super flatness
Single side polish • (GBIR<0.5 m m)
Double side polish
•
Final Haze polish 10
•
----- End of picture text -----
Products
Trading (Agent/Distributor)
==> picture [86 x 48] intentionally omitted <==
==> picture [697 x 411] intentionally omitted <==
----- Start of picture text -----
Multi
Exclusive
applicati
Agency
on
Supply Chain
Partnership
----- End of picture text -----
11
Future Product-based Extension Prospect
==> picture [86 x 48] intentionally omitted <==
Wet Process Equipment ------------------- Front-end Wet Process Equipment Wafer Support System Mass Spectrometer
==> picture [347 x 399] intentionally omitted <==
----- Start of picture text -----
Equipment
Manufacturing
Trading
Wafer
(Agent/Distr
Reclaim
ibutor)
----- End of picture text -----
Semiconductor and Optoelectronics Process Equipment
12” Wafer Reclaim ------------------- SiC Wafer Reclaim
AMOLED Advanced Process Miniaturization
12
Q & A
==> picture [86 x 48] intentionally omitted <==
==> picture [447 x 252] intentionally omitted <==
Thank You!
13