Nova Ltd. — Regulatory Filings 2014

Jul 8, 2014

==> picture [42 x 34] intentionally omitted <==

==> picture [51 x 34] intentionally omitted <==

==> picture [52 x 34] intentionally omitted <==

==> picture [51 x 34] intentionally omitted <==

==> picture [52 x 34] intentionally omitted <==

==> picture [51 x 34] intentionally omitted <==

==> picture [52 x 34] intentionally omitted <==

==> picture [52 x 34] intentionally omitted <==

==> picture [30 x 34] intentionally omitted <==

Company Contact: Investor Relations Contacts: Dror David, Chief Fi n ancial Officer Hay d en/ MS-IR LLC Nova Measuring Ins t ruments L t d. Miri S egal Tel: +97 2 -73-229-5 8 33 Tel: + 917-607- 8 654 E-mail: i n fo@nova m easuring.c o m E-m a il: msegal @ ms-ir.co m www.no v ameasurin g .com Or David Fore Tel: + 206-395- 2 711 E-m a il: dave@ h aydenir.c o m

Nova’s Through-Silicon-Via Metrology Solution Selected by Leading IC Manufacturer N ova V2 60 0™qu a lified as t ool of r e cord for logic an d memor y a p plicatio n s

REHOVOT, Israel, July 8, 2014 - Nova Measuring Instruments (Nasdaq: NVMI) , a leading innovator a nd a key p rovider of optical m e trology so l utions for advanced process control used in se m iconductor manufac t uring, announced to d ay that a major cus t omer in Asia pla c ed an order for its Through-Sil i con-Via ( T SV) metrology soluti o n. This is the first order fro m this cus t omer for Nova’s TSV stand-alo n e metrolo g y solution .

Followin g an inten s ive evalu a tion in a p roduction environm e nt, Nova’ s V2600™ solution was qua l ified to be the produ c tion tool of record ( P TOR) for m easuring and contr o lling the TSV fo r mation p rocess in both m emory a n d logic applicatio n s. The planned impleme n tation of Three-Di m ensional (3D) Integration in v o lume ma n ufacturing by this custome r is expect e d to yield multiple or d ers over the next fe w years.

Nova’s V 2600™ w as selected over a lternative solutions primarily d ue to its unique capabilities to acc u rately me a sure all critical TSV dimensio n s, includi n g side-wall angle, bottom d iameter, and bottom curvature. Nova’s in n ovative p a tented te c hnology c o mbines an optic a l method, Dark-Field Reflecto m etry, whic h is highly s ensitive t o variation s in TSV internal s tructures, with a no v el modeli n g engine f or non-pe r iodic stru c tures. The system was co n firmed to enable ti g ht and r e liable pr o cess control at hig h samplin g rates, minimizi n g potential yield loss due to TS V electrica l failures.

“Our sel e ction by t h is top cu s tomer co n firms the c ompetitiv e advantag e that our solution offers to the secto r ,” said Eitan Oppen h aim, Pre s ident and CEO of Nova. “Our industry collabor a tion and t echnologi c al innova t ion in sp e cialized s catterome t ry solutio n s have identifie d a previously unadd r essed cus t omer nee d and resulted in a unique solu t ion that enables the adva n cement o f 3D Integration in v olume m a nufacturin g . This si g nificant mileston e is a res u lt of our strategy t o strength e n our co o perative efforts with leading custome r s to iden t ify critical process i s sues and offer uni q ue solutions throug h out the

==> picture [42 x 34] intentionally omitted <==

==> picture [51 x 34] intentionally omitted <==

==> picture [52 x 34] intentionally omitted <==

==> picture [51 x 34] intentionally omitted <==

==> picture [52 x 34] intentionally omitted <==

==> picture [51 x 34] intentionally omitted <==

==> picture [52 x 34] intentionally omitted <==

==> picture [52 x 34] intentionally omitted <==

==> picture [30 x 34] intentionally omitted <==

device li f ecycle. W e are looki n g forward to enhan c ing our collaboration with this c u stomer to gener a te further orders in t h e future.”

About Nova : Nova Measuring Instrument Ltd. deliver s continu o us innov a tion by providin g advance d optical metrology solutions for the s e micondu c tor manufacturing industry. Deploye d with th e world’s largest in t egrated-ci r cuit man u facturers, Nova’s products deliver s tate-of-th e -art, high-performa n ce metro l ogy solutions for e ffective process control t h roughout the semiconductor fabricatio n lifecycle. Nova’s product portfolio, which co m bines hig h -precision hardware a nd cuttin g -edge soft w are, sup p orts the develop m ent and productio n of the most ad v anced d e vices in today’s h igh-end semicon d uctor m a rket. Nova’s techn i cal innov a tion and market leadership enable custome r s to improve proces s performa n ce, enha n ce produc t s’ yields and acceler a te time to mark e t. Nova acts as a pa r tner to se m iconduct o r manufacturers fro m its office s around the world. Addi t ional inf o rmation may be found a t www.n o vameasu r ing.com Nova is t raded on t h e NASD A Q & TASE under the symbol N V MI.

This press r e lease contains f orward-looking statements with i n the meaning o f safe harbor p rovisions of the Private Securit i es Litigation Reform Act o f 1995 relating t o future events or our future p e rformance, suc h as statements regarding trends, demand for o ur products, expected de l iveries, transac t ion, expected r evenues, operating results, ea r nings and profitability. Forwar d -looking statem e nts involve known and u nknown risks, uncertainties and other facto r s that may ca u se our actual results, levels of activity, per f ormance or achievement s to be material l y different from any future results, levels of ac t ivity, performan c e or achievem e nts expressed o r implied in those forwar d looking statem e nts. These risk s and other fact o rs include but a re not limited t o : our depende n cy on two prod u ct lines; our dependency o n a small num b er of large cust o mers and smal l number of sup p liers; the highly cyclical nature o f the markets we target; our inability to re d uce spending d uring a slowdo w n in the semic o nductor industr y ; our ability to r e spond effectiv e ly on a timely b a sis to rapid technological changes; our d e pendency on P E M; risks relate d to exclusivity o b ligations and n o n-limited liabilit y that may be in c luded in our commercial a greements and arrangements; o ur ability to retain our competiti v e position desp i te the ongoing c onsolidation in o ur industry; risks related to our depende n ce on a single m anufacturing f a cility; risks related to the extre m ely competitive market we are o peration in; risks related t o changes in o u r order backlog ; risks related to the financial, p o litical and envir o nmental instabilities in Asia; ris k s related to our intellectu a l property; ne w product offeri n gs from our co m petitors; unanticipated manufacturing or supp l y problems; ch a nges in tax requirements; changes in cu s tomer demand for our product s ; risks related t o currency fluctuations and risks related to our o perations in Israel. We c a nnot guarantee future results, l e vels of activity, performance o r achievements. The matters dis c ussed in this p r ess release also involve r isks and uncer t ainties summar i zed under the h eading “Risk F a ctors” in Nova’ s Annual Repor t on Form 20-F for the year ended Dece m ber 31, 2013 fil e d with the Sec u rities and Exchange Commissio n on February 2 8 , 2014. These f a ctors are updat e d from time to time thro u gh the filing of reports and r egistration stat e ments with th e Securities an d Exchange Co m mission. Nov a Measuring Instruments L td. does not as s ume any obligat i on to update th e forward-lookin g information co n tained in this pr e ss release.