Nova Ltd. — Investor Presentation 2014

Sep 16, 2014

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Company Contact: Investor Relations Contacts: Dror David, Chie f Financial O fficer Ha y den/ MS-IR LLC Nov a Measuring Instrument s Ltd. Miri Segal Tel: + 972-73-22 9 -5833 Tel: +917-607- 8 654 E-m a il: info@no v ameasurin g .com E- m ail: msegal @ ms-ir.com www.novameas u ring.com Or Da v id Fore Tel: +206-395- 2 711 E- m ail: dave@ h aydenir.co m

Nova Selected for 10nm and 7nm Technology Nodes by Leading Logic Manufacturer

Competitiv e Selection P rocess and S u bsequent Wi n Driven by N ova’s Super i or FinFET M e trology Sol u tion

REHOVOT, Israel, September 16, 2014 - Nova Measuring Instruments (Nasdaq: NVMI) , a leadi n g innovat o r and a k e y provider of optical metrology solutions f o r adv a nced proc e ss control used in se m iconductor manufact u ring, ann o unced tod a y that a leading l o gic manuf a cturer sel e cted Nova’ s Optical C D metrolo g y solution t o sup p ort the dev e lopment and future m anufacturi n g of its 10 n m and 7n m technolo g y nod e s, covering both FEO L and BEO L applications in Litho, Etch, Dep o sition, CMP and Epi proce s s steps. T he select i on includ e s Nova’s advanced stand-alo n e metr o logy tools e t, the Nov a MARS m o deling plat f orm and N ova’s new High-PowerComputing (HP C ) server for 3D applic a tions solut i ons.

Nov a ’s solution was select e d followin g a competi t ive evaluation betwee n the leadi n g Opti c al CD suppliers for f r ont-end and back-en d of line a p plications. Through t h e eval u ation pro c ess vend o rs were r e quired to demonstr a te advanc e d solutio n s cap a ble of han d ling the fu t ure challe n ges of criti c al dimension (CD) m e asuremen t s of 3D FinFET gates. No v a’s soluti o n was se l ected due to superi o r metrolo g y perf o rmance in b enchmark applications, providin g excellent f leet matching precisio n . Nov a ’s holistic m etrology a pproach, c o mbining N ovaMARS modeling s oftware, fa s t time to solution and uniqu e channels of measu r ement, su c h as Darkfield Spectr a l Refl e ctometry ( D SR), has d emonstrat e d the perf o rmance a n d extendi b ility requir e d to m e et the challenges of 1 0 nm and 7 n m technol o gy develo p ment.

“We are very p r oud with this selectio n of our sta n d-alone metrology solution for t h e 10n m and 7nm advanced t echnology nodes. We view this a s clear evi d ence of o u r tech n ology lead e rship and innovation i n the Opti c al CD metr o logy spac e .” said Eit a n Opp e nhaim, N o va’s President & C E O. “This selection r eaffirms o u r solution’s sup e riority for advanced FinFET devices i n both fr o nt-end and back-e n d applications. This win provides yet ad d itional sup p ort for our strategy to partner wi t h our c ustomers e arly in thei r developm e nt proces s in order t o generate g reater val u e in later stages o f high-volu m e manufa c turing.”

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About Nova : Nova Measuring Instrument Ltd. delivers c o ntinuous i n novation b y providing advanced optical metrology s olutions f o r the semi c onductor m anufacturi n g indu s try. Deplo y ed with th e world’s largest integ r ated-circui t manufact u rers, Nova’s prod u cts delive r state-of-the-art, high-performan c e metrology solutions for effecti v e proc e ss control throughou t the semiconductor f a brication li f ecycle. N o va’s produ c t portf o lio, which combine s high-pre c ision hard w are and cutting-ed g e softwar e , sup p orts the development and produ c tion of the most advanced devic e s in today’s high - end semic o nductor m a rket. Nov a ’s technical innovatio n and mark e t leadersh i p ena b le custom e rs to impr o ve proces s performa n ce, enhan c e product s ’ yields a n d accelerate time to market. Nova acts as a partn e r to semic o nductor m anufacture r s from its office s around the world. Addition a l informati o n may b e found a t ww w .novameasuring.com. Nov a is traded o n the NAS D AQ & TA S E under th e symbol N V MI.

This p r ess release cont a ins forward-loo k ing statements w ithin the meaning of safe harbor provisions of th e Private Securit i es Litigati o n Reform Act of 1995 relating to f u ture events or o u r future performa n ce, such as stat e ments regardin g trends, demand f or our pr o ducts, expected deliveries, transaction, expected r e venues, operati n g results, earni n gs and profitabil i ty. Forward-looki n g statem e nts involve kno w n and unknown r isks, uncertaintie s and other facto r s that may caus e our actual results, levels of activ i ty, perfor m ance or achieve m ents to be mat e rially different fr o m any future re s ults, levels of a c tivity, performan c e or achieveme n ts expres s ed or implied in those forward l o oking statemen t s. These risks a nd other factors include but are not limited to: o ur depen d ency on two product lines; our d e pendency on a small number of large customers and small number of suppliers; the highly c yclical nature of the markets we t a rget; our inabilit y to reduce spen d ing during a slo w down in the semiconductor indust r y; our ab i lity to respond effectively on a ti m ely basis to ra p id technological changes; our d e pendency on P E M; risks related to exclusi v ity obligations a n d non-limited lia b ility that may be i n cluded in our co m mercial agree m ents and arrangements; our abilit y to retain o ur competitive position despite t h e ongoing cons o lidation in our i n dustry; risks rel a ted to our depe n dence on a sin g le manuf a cturing facility; ri s ks related to the extremely comp e titive market we a re operation in; risks related to c h anges in our or d er backlo g ; risks related to the financial, poli t ical and environ m ental instabilitie s in Asia; risks re l ated to our intell e ctual property; n e w produc t offerings from o u r competitors; u n anticipated man u facturing or sup p ly problems; cha n ges in tax requi r ements; changes in customer demand for o u r products; risks related to curren c y fluctuations a n d risks related t o our operations i n Israel. We can n ot guaran t ee future results, levels of activity, performance or a chievements. T h e matters discus s ed in this press r elease also invo l ve risks a n d uncertainties s ummarized under the heading “Ri s k Factors” in N o va’s Annual Rep o rt on Form 20- F for the year ended Decem b er 31, 2013 file d with the Securi t ies and Exchange Commission o n February 28, 2 0 14. These facto r s are updated fr o m time to time through t h e filing of repor t s and registrati o n statements wi t h the Securities and Exchange Commission. Nova Measu r ing Instruments L td. does not as s ume any obliga t ion to update th e forward-lookin g information con t ained in this pr e ss releas e .