Nova Ltd. — Regulatory Filings 2005

Jul 7, 2005

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Company Contact:

Investor relations Contacts:

Chai Toren, CFO Ehud Helft / Kenny Green Nova Measuring Instruments Ltd. Gelbart Kahana Tel: 972-8-938-7505 Tel: +1-866-704-6710 E-mail: info@nova.co.il E-mail : Ehud@gk-biz.com http://www.nova.co.il Kenny@gk-biz.com

Nova Introduces the Enhanced Throughput Integrated NovaScan 3090CD with Multiple Etch System Manufacturers

Nova continues the introduction of its NovaScan 3090 Series for additional semiconductor manufacturing processes and OEM integrations

Rehovot, Israel—July 7, 2005 - Nova Measuring Instruments Ltd. (NASDAQ: NVMI), the market leader in integrated measurement and process control for the semiconductor industry, today announced the successful integration of its enhanced NovaScan 3090CD metrology system on several etchers. In March 2005, Nova previously announced the successful integration of the system on a Lam Research Corporation 2300 Exelan[®] Etch System.

The NovaScan 3090CD series forms an advanced metrology platform for Critical Dimension (CD) control and profile measurements, and is designed so that it can operate both as an integrated metrology and standalone platform for 200mm and 300mm systems, for 65nm IC manufacturing and beyond. It is based on Nova’s earlier field proven technology platform, the NovaScan 3060CD system. NovaScan 3090CD is integrated using the exact same configuration as the NovaScan 3060CD system, thus offering customers an easy upgrade path. Equipped with a single polarized channel, from Deep-UV to Near-IR, the NovaScan 3090CD supports the measurement of 2D structures and enables 3D shape characterization.

The NovaScan 3090CD system provides real-time measurement of CD, trench depth, photoresist height, thickness and shape of complex layer stacks. The reliable single channel system provides the highest throughput of an integrated system in the market, while maintaining the cleanliness and hermetic structure needed to operate in different process conditions. The system demonstrates a 100% performance improvement in metrology capabilities over the NovaScan 3060CD, with enhanced throughput capabilities, while integration and physical layout remain unchanged.

Dr. Giora Dishon, Nova’s President & CEO, states: “Our newest process control solutions include metrology capabilities for oxide CMP along with new enabling methods and systems for copper CMP, CVD, Photolithography and Etch. Scatterometry based systems and SW are becoming the dominant leading edge technology enabling advanced process control, and the integration of the NovaScan 3090CD system in multiple etchers offers IC manufacturers advanced integrated metrology solutions for all etch processes. We will continue to bring new systems, solutions and capabilities to meet the needs of high volume manufacturing with advanced technologies of 65nm and beyond.”

About Nova : Nova Measuring Instruments Ltd. develops, designs and produces integrated process control systems in the semiconductor manufacturing industry. Nova provides a broad range of integrated process control solutions that link different semiconductor processes and process equipment. The Company's website is www.nova.co.il