Meyer Burger Technology AG — Regulatory Filings 2007

Jan 16, 2007

News Details

Corporate | 16 January 2007 09:40

Roth & Rau AG

Roth & Rau AG / Miscellaneous

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The issuer is solely responsible for the content of this announcement.

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• Roth & Rau awarded the 'Chemnitz Milestone' prize
• Agreement signed with Fraunhofer Institute concerning thin layer solar
  technology cooperation

Hohenstein-Ernstthal, 16 January 2007 – Roth & Rau AG was yesterday awarded
the 'Chemnitz Milestone' prize. This prize is awarded by the Chemnitz
Marketing Club on an annual basis to honour outstanding entrepreneurial
achievement. The jury highlighted the farsighted, premature and courageous
focus of Roth & Rau AG on a strategic growth field as representing the
company’s outstanding achievement. 'We should like to thank the Board of
Chemnitz Marketing Club for this special accolade,' commented Dr. Dietmar
Roth, CEO of Roth & Rau AG. 'Although our company is active on an
international level, we nevertheless attach great importance to our
regional roots. We are proud to be able to make a positive contribution to
the positive economic development of the Chemnitz region.'

Following the awarding of the prize, Dr. Dietmar Roth and Prof. Eicke
Weber, Director of the Fraunhofer Institute for Solar Energy Systems (ISE),
signed a joint memorandum of understanding providing for the commercial
development of the thin layer solar technology known as 'epitactic wafer
equivalents'. The progressing of this technology, which has been developed
at ISE, as far as readiness for production is to be undertaken within a
development project lasting around two and a half years. Work is expected
to begin within the next three months.

The new technology is based on wafers consisting of a form of silicon which
is low-grade, inexpensive and, most importantly, available in sufficient
quantities. A thin layer of high-quality silicon is then applied to the
wafers. The wafer resulting from this mixture of materials can then be
further processed like any conventional wafer. The particular benefit of
this technology is the enormous cost saving potential with only a slight
loss of effectiveness. 'We see this wafer-equivalent technology as
representing a promising alternative both to conventional wafer
technologies and to existing forms of thin layer technology. One
particularly interesting feature for us is that we will be able to draw on
proven crystalline technology, meaning that it is certainly conceivable
that this method can be used within the framework of our turnkey production
line concept,' explained Dr. Roth.

About Roth & Rau AG:
Roth & Rau AG, which has been listed on the Frankfurt
Stock Exchange since 11 May 2006 (ISIN DE000A0JCZ51), develops and
manufactures equipment and process systems on the basis of plasma and ion
beam technology and supplies these to a global customer base in a wide
variety of sectors. Roth & Rau’s photovoltaic business field focuses on
providing antireflective coating facilities for crystalline silicon solar
cells. With a global market share of around one third, Roth & Rau is the
global market leader in this area. The company’s second business field of
plasma and ion beam technology, which accounted for around 30% of total
sales in the past financial year, develops equipment for the semiconductor
and automotive industries, as well as for research and development in
various sectors.

Contact:
Haubrok Investor Relations GmbH
Simone Gorny
Kaistraße 16
40221 Düsseldorf
Tel.: +49 (0) 211/30126-130
Fax: +49 (0)211/30126-172
E-Mail: s.gorny@haubrok.de

DGAP 16.01.2007

Language: English
Issuer: Roth & Rau AG
Gewerbering 3 OT Wüstenbrand
09337 Hohenstein-Ernstthal Deutschland
Phone: 0372349880
Fax: 03723 498825
E-mail: silvia.roth@roth-rau.de
WWW: www.roth-rau.de
ISIN: DE000A0JCZ51
WKN: A0JCZ5
Indices:
Listed: Freiverkehr in Berlin-Bremen, Düsseldorf, München, Stuttgart;
Entry Standard in Frankfurt

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