AIXTRON SE

Earnings Release • Nov 7, 2005

News Details

Corporate | 7 November 2005 08:40

Aixtron AG:RiTdisplay qualifies AIXTRON OVPD(R) Technology

Corporate-news transmitted by DGAP. The issuer is solely responsible for the content of this announcement. —————————————————————————— RiTdisplay qualifies AIXTRON OVPD(R) Technology for OLED manufacturing Leading supplier of OLED displays signs off final acceptance of Gen2 OVPD(R) system for OLED mass production Hsin-Chu, Taiwan, November xx, 2005 – RiTdisplay Corporation, the leading manufacturer and supplier of OLED displays, has signed off the system acceptance of the first Gen2 OVPD(R) system for mass production of OLEDs. The engineering teams of RiTdisplay and AIXTRON could jointly qualify OVPD(R) technology for manufacture of OLED devices for full color display applications. The ß-testing co-operation yielded OLED devices with better performance as compared to devices manufactured with conventional technology (VTE). Dr. Yih Chang, General Manager of RiTdisplay, states: “The impressive performance of our OLEDs made by OVPD(R) has proven our investment into this new technology to be right. Use of this new leading edge technology will foster and strengthen our positioning in the OLED display market.” AIXTRON’s Executive Vice President and COO Dr. Bernd Schulte adds: “The close collaboration between the expert teams at RiTdisplay and AIXTRON was key to the successful qualification of AIXTRON’s OVPD(R) technology. In an impressively short period of time the Gen2 could be taken from prototyping to manufacturing stage. Our teams will continue the strong collaboration efforts for further improvements and full exploitation of the OVPD(R) potentials.” The qualification of the Gen2 manufacturing tool is the breakthrough for OVPD(R) technology. Based on gas phase transport and AIXTRON’s proprietary Close Coupled Showerhead (CCS) technology OVPD(R) has significant advantages over conventional deposition equipment (VTE), such as precise control of deposition rates, long term process stability and reproducibility, high throughput due to high deposition rates, high yield due to excellent uniformity, low maintenance and running cost due to highly efficient material utilization etc. The gas phase process further enables realization of advanced device structures including for example graded layers.Organic Vapor Phase Deposition OVPDÒ OVPDÒ technology has been exclusively licensed to AIXTRON from Universal Display Corporation (UDC), Ewing, N.J. (USA) for equipment manufacture. OVPDÒ technology is based on an invention by Professor Stephen R. Forrest et. al. at Princeton University, USA, which was exclusively licensed to UDC. AIXTRON and UDC have jointly developed and qualified OVPDÒ pre-production equipment. About AIXTRON:AIXTRON AG (FSE: AIX, ISIN DE0005066203; NASDAQ: AIXG, ISIN: US0096061041) is a leading provider of deposition equipment to the semiconductor industry. The Company’s technology solutions are used by a diverse range of customers worldwide to build advanced components for electronic and opto-electronic applications based on compound, silicon, or organic semiconductor materials. Such components are used in fiber optic communication systems, wireless and mobile telephony applications, optical and electronic storage devices, computing, signaling and lighting, as well as a range of other leading-edge technologies. AIXTRON AG’s securities are listed on the Prime Standard market segment of the Frankfurt Stock Exchange and, as American Depositary Shares (ADS), on NASDAQ, and are included in the TecDAX index, the NASDAQ Composite Index, the MSCI World Small Cap Index and the Nature Stock Index (NAI). Founded in 1983, the Company is headquartered in Aachen, Germany. Additional information is available on AIXTRON’s website at www.aixtron.com.Forward-Looking Statements:This news release may contain forward-looking statements about the business, financial condition, results of operations and earnings outlook of AIXTRON within the meaning of the “safe harbor” provisions of the United States Private Securities Litigation Reform Act of 1995. Words such as “may,” “will,” “expect,” “anticipate,” “contemplate,” “intend,” “plans,” “believe,” “continue” and “estimate,” and variations of these words and similar expressions, identify these forward- looking statements. These statements are not guarantees of future performance, involve certain risks, uncertainties and assumptions that are difficult to predict, and are based upon assumptions as to future events that may not prove accurate. Therefore, actual outcomes and results may differ materially from what is expressed herein. In any forward-looking statement in which AIXTRON expresses an expectation or belief as to future results, such expectation or belief is expressed in good faith and believed to have a reasonable basis, but there can be no assurance that the statement or expectation or belief will result or be achieved or accomplished. Actual operating results may differ materially from such forward-looking statements and are subject to certain risks, including risks arising from: actual customer orders received by AIXTRON; the extent to which chemical vapor deposition, or CVD, technology is demanded by the market place; the timing of final acceptance of products by customers; the financial climate and accessibility of financing; general conditions in the thin film equipment market and in the macro-economy; cancellations, rescheduling or delays in product shipments; manufacturing capacity constraints; lengthy sales and qualification cycles; difficulties in the production process; changes in semiconductor industry growth; increased competition; exchange rate fluctuations; availability of government funding; variability and availability of interest rates; delays in developing and commercializing new products; general economic conditions being less favorable than expected; and other factors. The forward-looking statements contained in this news release are made as of the date hereof and AIXTRON does not assume any obligation to (and expressly disclaims any such obligation to) update the reasons why actual results could differ materially from those projected in the forward-looking statements. Any reference to the Internet website of AIXTRON is not an incorporation by reference of such information in this news release, and you should not interpret such a reference as an incorporation by reference of such information. Additional Information:For additional information about factors that could affect our future financial and operating results, see our filings with the Securities and Exchange Commission, including the Registration Statement on Form F-4 (Regis.No. 333-122624) filed with the Commission on February 8, 2005 and available at the Commission’s website at www.sec.gov. End of announcement (c)DGAP 07.11.2005 —————————————————————————— WKN: 506620; ISIN: DE0005066203; Index: TecDAX Listed: Geregelter Markt in Frankfurt (Prime Standard); Freiverkehr in Berlin- Bremen, Düsseldorf, Hamburg, Hannover, München und Stuttgart