SÜSS MicroTec SE

Regulatory Filings • May 18, 2016

News Details

Corporate | 18 May 2016 14:00

SUSS MicroTec Launches LI Series – the New Operator-Assisted Surface Laser Imagers

DGAP-News: SÜSS MicroTec AG / Key word(s): Product Launch

2016-05-18 / 14:00

The issuer is solely responsible for the content of this announcement.

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SUSS MicroTec Launches LI Series – the New Operator-Assisted Surface Laser Imagers

Garching, May 19, 2016 – SUSS MicroTec, a global supplier of equipment and process solutions for the semiconductor industry and related markets, has launched the LI Series – a new Surface Laser Imaging platform as pre-announced on May 4, 2016.

The highly versatile technology of the LI for laser surface processing ranges from sub micrometric pattering of resist coated substrates to micro-ablation, photo-chemistry treatment as well as metrology.

The patterns, defined by a CAD process, are transferred by accurately moving the targeted substrates underneath a focused and scanning laser beam. In addition, the Laser Imager configuration is highly customizable, to best fit the specific requirements of each user. The technology supports substrate sizes from small pieces up to 300 mm, and it reaches a resolution down to 0.8 µm. Multi-layer alignment is possible via both top and bottom side alignment optical systems. Beside the 405 nm GaN laser for standard thin resist lithography processes, a second laser source can also be added to additionally address diverse processes such as, among other, thick resists like SU8, and infrared sensitive materials.

Core advantage of the Laser Imager is its flexibility, making it suitable for the various requirements of academic and industrial R&D facilities. The main applications include a wide variety of nano- and 3D structuring for high resolution wafer lithography, micro-optical components, sensors, microfluidic devices, and photo mask manufacturing.

“With the Surface Laser Imaging platform, we add a tool to our product portfolio that expands our existing exposure equipment set towards higher resolution requirements for leading edge applications.” says Dr. Per-Ove Hansson, CEO of SUSS MicroTec AG. “With this addition, we are enhancing our leadership position and offering the most comprehensive set of products and technologies for the lithography R&D market.”

About SUSS MicroTec

SUSS MicroTec is a leading supplier of equipment and process solutions for microstructuring in the semiconductor industry and related markets. In close cooperation with research institutes and industry partners SUSS MicroTec contributes to the advancement of next-generation technologies such as 3D Integration and nanoimprint lithography as well as key processes for MEMS and LED manufacturing. With a global infrastructure for applications and service SUSS MicroTec supports more than 8.000 installed systems worldwide. SUSS MicroTec is headquartered in Garching near Munich, Germany. For more information, please visit http://www.suss.com

Contact:

SUSS MicroTec AG

Franka Schielke

Schleissheimer Strasse 90

85748 Garching, Deutschland

Tel.: +49 (0)89 32007-161

Fax: +49 (0)89 32007-451

Email: franka.schielke@suss.com

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2016-05-18 Dissemination of a Corporate News, transmitted by DGAP – a service of EQS Group AG.

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Language:	English
Company:	SÜSS MicroTec AG
	Schleissheimer Strasse 90
	85748 Garching
	Germany
Phone:	+49 (0)89 32007-161
Fax:	+49 (0)89 32007-451
E-mail:	ir@suss.com
Internet:	www.suss.com
ISIN:	DE000A1K0235
WKN:	A1K023
Indices:	TecDAX
Listed:	Regulated Market in Frankfurt (Prime Standard); Regulated Unofficial Market in Berlin, Dusseldorf, Hamburg, Munich, Stuttgart

End of News	DGAP News Service