Scientech — Investor Presentation 2017

Dec 13, 2017

==> picture [86 x 48] intentionally omitted <==

==> picture [232 x 122] intentionally omitted <==

(3583)

2017/12/13

1

Safe Harbor Statement

==> picture [86 x 48] intentionally omitted <==

• This Presentation contains certain forward-looking statements that are based on current expectations and are subject to known and unknown risks and uncertainties that could cause actual results to differ materially from those expressed or implied by such statements.

• Except as required by law, we undertake no obligation to update any forward –looking statements, whether as a result of new information, future events or otherwise.

2

Scientech Corp (3583: TT)

==> picture [86 x 48] intentionally omitted <==

==> picture [525 x 318] intentionally omitted <==

----- Start of picture text -----

|||
|---|---|
|Company|
|Establishment|1979/10/17|
|IPO|2013/3/12|
|Capital|NT$ 811 Million|
|Chairman|H.L. Hsieh|
|President|M.T. Hus|
|、|、|
|Equipment Manufacturing|Wafer Reclaim|
|Products|
|Trading(Agent/Distributor)|

----- End of picture text -----

3

==> picture [86 x 48] intentionally omitted <==

Business Overvies Products

Future Prospect

4

Business Overview

Income Statement

==> picture [86 x 48] intentionally omitted <==

Units：NT $ M	2013	2014	2015	2016	3Q17	1Q~3Q17
Revenues	3,068	2,717	2,942	3,495	885	2,428
Gross Profit	983	970	903	1,178	335	864
Operating Expenses	629	673	779	835	215	611
Operating Income	354	297	124	343	120	253
Other Income and Expenses	(26)	20	(6)	21	(15)	(26)
Income Before Tax	328	317	119	363	105	227
Net Income	249	246	86	292	86	177
EPS	3.11	3.04	1.06	3.60	1.06	2.18
Gross Margin	32.04%	35.71%	30.69%	33.71%	37.91%	35.60
Operating Margin	11.53%	10.93%	4.23%	9.80%	13.62%	10.44%
Income Before Tax margin	10.69%	11.68%	4.03%	10.40%	11.86%	9.33%

5

Business Overview

Products Mix

==> picture [86 x 48] intentionally omitted <==

Units：%	2013	2014	2015	2016	1Q~3Q17	Gross Margin
Trading	59	50	59	51	52	Below Average
Manufacturing	41	50	41	49	48	Above Average

==> picture [546 x 218] intentionally omitted <==

6

Business Overview

R&D Expenses

==> picture [86 x 48] intentionally omitted <==

Units：NT $ M	2013	2014	2015	2016	1Q~3Q17
R&D Expenses	131	160	196	226	171
Expenses as % of Revenue	4.27%	5.89%	6.66%	6.48%	7.06%

==> picture [531 x 217] intentionally omitted <==

7

Products

==> picture [86 x 48] intentionally omitted <==

==> picture [664 x 400] intentionally omitted <==

----- Start of picture text -----

Wet Process
Equipment
Equipment
Manufacturing
Trading
Wafer
(Agent/Distr
Reclaim
ibutor)
Semiconductor and 12” Wafer
Optoelectronics
Reclaim
Process Equipment
----- End of picture text -----

8

Products

Equipment Manufacturing

==> picture [86 x 48] intentionally omitted <==

Wet process equipment  Single wafer/ Batch type

• 8”/12’ Advanced packaging

==> picture [350 x 228] intentionally omitted <==

----- Start of picture text -----

、
----- End of picture text -----

、 、 (Fan-out Solder Bump 、 、 Copper Pillow Bumping 、 、 Gold Bump RDL TSV …ect)

• 6”/ 8”/12” Front-end special 、 、

• process (IoT Sensor Power IC 、 、 、

• FP sensor RF CMOS Touch 、

• Controller MEMS)

• HB LED fully-automatic process

• MEMS

• III-V

9

Products Si Wafer Reclaim

==> picture [86 x 48] intentionally omitted <==

==> picture [683 x 430] intentionally omitted <==

----- Start of picture text -----

Advanced clean technology
Complete particle inspection
20nm/ 16nm Particle
• (SP1-DLS & SP2)
Low trace metal (<5E9)
•
 12” Wafer Reclaim
Cleaning Etching

Capacity: 120K / month

Separated Cu & Non Cu
Line
Full Process
Optimization
Polishing Grinding
Complete polishing process Super flatness
Single side polish • (GBIR<0.5 m m)
Double side polish
•
Final Haze polish 10
•
----- End of picture text -----

Products

Trading (Agent/Distributor)

==> picture [86 x 48] intentionally omitted <==

==> picture [697 x 411] intentionally omitted <==

----- Start of picture text -----

Multi
Exclusive
applicati
Agency
on
Supply Chain
Partnership
----- End of picture text -----

11

Future Product-based Extension Prospect

==> picture [86 x 48] intentionally omitted <==

Wet Process Equipment ------------------- Front-end Wet Process Equipment Wafer Support System Mass Spectrometer

==> picture [347 x 399] intentionally omitted <==

----- Start of picture text -----

Equipment
Manufacturing
Trading
Wafer
(Agent/Distr
Reclaim
ibutor)
----- End of picture text -----

Semiconductor and Optoelectronics Process Equipment

12” Wafer Reclaim ------------------- SiC Wafer Reclaim

---

AMOLED Advanced Process Miniaturization

12

==> picture [115 x 56] intentionally omitted <==

==> picture [377 x 399] intentionally omitted <==

==> picture [86 x 48] intentionally omitted <==

==> picture [44 x 40] intentionally omitted <==

AMS-200-1 inTrap MALDI Mass Spectrometer - Range: 500 500kDa Resolution: 10Da@100kDa Precision: 100Da@100kDa (for intact protein analysis)

==> picture [115 x 56] intentionally omitted <==

Highly Integrated System

==> picture [86 x 48] intentionally omitted <==

AMS-200-1

Without any external pump & gas cylinder, all modules are consolidated in a desktop !

==> picture [500 x 309] intentionally omitted <==

Size: 60 cm W x 50 cm D x 50 cm H

Weight: < 40 Kg

==> picture [115 x 56] intentionally omitted <==

Compact & Novel Design

==> picture [86 x 48] intentionally omitted <==

High-precision miniature assembly of all-homemade key components ---

==> picture [496 x 376] intentionally omitted <==

multiple sample inlet ! high-precision mass analyser ! 3D-printed Knudsen-flow gas nozzle ! & highly sensitive charge detector !!

==> picture [115 x 56] intentionally omitted <==

Charge Sensing Particle Detector

==> picture [86 x 48] intentionally omitted <==

“Very-Simple” proprietary charge detector … no HV bias, no high vacuum required ! (resolution 10Da@100kDa)

==> picture [309 x 163] intentionally omitted <==

==> picture [210 x 102] intentionally omitted <==

==> picture [495 x 175] intentionally omitted <==

==> picture [115 x 56] intentionally omitted <==

Phase-Synthesized MS Platform

==> picture [86 x 48] intentionally omitted <==

Versatile waveform via ion-trap dynamics for proprietary mass spectrometry ---

==> picture [390 x 347] intentionally omitted <==

==> picture [310 x 196] intentionally omitted <==

frequency jitter ~ 1e-4 !!

==> picture [115 x 56] intentionally omitted <==

Wide & Linear Mass Range

==> picture [86 x 48] intentionally omitted <==

==> picture [513 x 128] intentionally omitted <==

Uncalibrated MALDI ion trap mass spectra of (a) insulin (5808 Da), (b) bovine serum albumin (BSA, 66.5k Da), and (c) immunoglobulin G (IgG from bovine serum, ~160k Da, Sigma-Aldrich). The mass spectra use unstable ejection with the main RF phase scan.

==> picture [306 x 205] intentionally omitted <==

Robust extension of mass range over 3 orders of magnitude … - 500 500kDa !

==> picture [115 x 56] intentionally omitted <==

Bio-Medical/Nano-Material Market

==> picture [86 x 48] intentionally omitted <==

High-resolution intact protein analysis

==> picture [115 x 56] intentionally omitted <==

+ Au cluster (14.3kDa) (197Da x n) Lysozyme

==> picture [86 x 48] intentionally omitted <==

High-resolution intact protein analysis Lysozyme-stab. gold nanoclusters (Lys-AuNCs) as functional nanomaterials

==> picture [450 x 323] intentionally omitted <==

Resolution: 10Da@100kDa Precision: 100Da@100kDa

Q & A

==> picture [86 x 48] intentionally omitted <==

==> picture [447 x 252] intentionally omitted <==

Thank You!

21